화학공학소재연구정보센터
검색결과 : 22건
No. Article
1 The effect of Cr barrier on interfacial reaction of Au/Zn/Au/Cr/Au contacts to p-type InGaAs/InP
Huang JS, Vartuli CB
Thin Solid Films, 446(1), 132, 2004
2 Comparison of inductively coupled plasma Cl-2 and Cl-4/H-2 etching of III-nitrides
Cho H, Vartuli CB, Donovan SM, Abernathy CR, Pearton SJ, Shul RJ, Constantine C
Journal of Vacuum Science & Technology A, 16(3), 1631, 1998
3 Electron-Cyclotron-Resonance Plasma-Etching of Algan in Cl-2/Ar and BCl3/Ar Plasmas
Vartuli CB, Pearton SJ, Lee JW, Polyakov AY, Shin M, Greve DW, Skronowski M, Shul RJ
Journal of the Electrochemical Society, 144(6), 2146, 1997
4 Inductively-Coupled Plasma-Etching of III-V Nitrides in CH4/H-2/Ar and CH4/H-2/N-2 Chemistries
Vartuli CB, Pearton SJ, Lee JW, Mackenzie JD, Abernathy CR, Shul RJ, Constantine C, Barratt C
Journal of the Electrochemical Society, 144(8), 2844, 1997
5 Plasma-Etching of III-Nitrides in ICl/Ar and IBr/Ar Plasmas
Vartuli CB, Pearton SJ, Lee JW, Mackenzie JD, Abernathy CR, Shul RJ
Journal of Vacuum Science & Technology A, 15(3), 638, 1997
6 Rapid Thermal-Processing of Ill-Nitrides
Hong J, Lee JW, Vartuli CB, Abernathy CR, Mackenzie JD, Donovan SM, Pearton SJ, Zolper JC
Journal of Vacuum Science & Technology A, 15(3), 797, 1997
7 Comparison of Ohmic Metallization Schemes for Ingaaln
Ren F, Vartuli CB, Pearton SJ, Abernathy CR, Donovan SM, Mackenzie JD, Shul RJ, Zolper JC, Lovejoy ML, Baca AG, Hagerottcrawford M, Jones KA
Journal of Vacuum Science & Technology A, 15(3), 802, 1997
8 Electron-Cyclotron-Resonance Etching of III-V Nitrides in IBr/Ar Plasmas
Vartuli CB, Pearton SJ, Lee JW, Mackenzie JD, Abernathy CR, Shul RJ
Journal of Vacuum Science & Technology B, 15(1), 98, 1997
9 Effect of BCl3 Dry-Etching on Inaln Surface-Properties
Ren F, Lothian JR, Chen YK, Mackenzie JD, Donovan SM, Vartuli CB, Abernathy CR, Lee JW, Pearton SJ
Journal of the Electrochemical Society, 143(9), L217, 1996
10 Selective Dry-Etching of III-V Nitrides in Cl-2/Ar, CH4/H-2/Ar, ICI/Ar, and IBr/Ar
Vartuli CB, Pearton SJ, Mackenzie JD, Abernathy CR, Shul RJ
Journal of the Electrochemical Society, 143(10), L246, 1996