검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Photoresist removal using an O-2/N-2 medium pressure plasma jet with high speed wafer scanning: Unimplanted resist studies Bhargava M, Craver B, Torres JL, Guo H, Vemula SC, Srivastava AK, Berry I, Wolfe JC Journal of Vacuum Science & Technology B, 27(6), 2480, 2009 |
| 2 |
Impact of the environmental conditions on the electrical characteristics of scanning spreading resistance microscopy Eyben P, Mody J, Vemula SC, Vandervorst W Journal of Vacuum Science & Technology B, 26(1), 338, 2008 |
| 3 |
Rapid prototyping of infrared bandpass filters using aperture array lithography Han KP, Morgan M, Ruiz A, Vemula SC, Ruchhoeft P Journal of Vacuum Science & Technology B, 23(6), 3158, 2005 |