화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Nuclear power, climate change and energy security: Exploring British public attitudes
Corner A, Venables D, Spence A, Poortinga W, Demski C, Pidgeon N
Energy Policy, 39(9), 4823, 2011
2 A low-thermal-budget in situ doped multilayer silicon epitaxy process for MOSFET channel engineering
Ban I, Ozturk MC, Misra V, Wortman JJ, Venables D, Maher DM
Journal of the Electrochemical Society, 146(3), 1189, 1999
3 Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - I. Role of implanted BF2
O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Xu MM, Maher DM
Journal of the Electrochemical Society, 146(8), 3070, 1999
4 Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - II. Role of implanted arsenic
O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Maher DM
Journal of the Electrochemical Society, 146(8), 3079, 1999
5 Secondary electron imaging as a two-dimensional dopant profiling technique : Review and update
Venables D, Jain H, Collins DC
Journal of Vacuum Science & Technology B, 16(1), 362, 1998
6 Factors affecting two-dimensional dopant profiles obtained by transmission electron microscopy of etched p-n junctions in Si
Neogi SS, Venables D, Na ZY, Maher DM
Journal of Vacuum Science & Technology B, 16(1), 471, 1998
7 Quantitative 2-Dimensional Dopant Profiles Obtained Directly from Secondary-Electron Images
Venables D, Maher DM
Journal of Vacuum Science & Technology B, 14(1), 421, 1996
8 Heteroepitaxy of Lattice-Matched Compound Semiconductors on Silicon
Bachmann KJ, Dietz N, Miller AE, Venables D, Kelliher JT
Journal of Vacuum Science & Technology A, 13(3), 696, 1995
9 A Study of Silicon Epitaxial-Growth on Silicon Substrates Exposed to Ar Electron-Cyclotron-Resonance Plasmas
Buaud PP, Hu YZ, Spanos L, Irene EA, Christensen KN, Venables D, Maher DM
Journal of Vacuum Science & Technology B, 13(4), 1442, 1995