검색결과 : 1건
No. | Article |
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1 |
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films Kim YJ, Choi YS, Choi IS, Han JG Current Applied Physics, 11(5), S54, 2011 |
No. | Article |
---|---|
1 |
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films Kim YJ, Choi YS, Choi IS, Han JG Current Applied Physics, 11(5), S54, 2011 |