화학공학소재연구정보센터
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No. Article
1 Plasma nitriding response at 400 degrees C of the single crystalline Ni-based superalloy MC2
Pichon L, Cormier J, Declemy A, Chollet S, Villechaise P, Dubois JB, Templier C
Journal of Materials Science, 48(4), 1585, 2013
2 Electron backscatter diffraction analysis of ZnO:Al thin films
Garcia CB, Ariza E, Tavares CJ, Villechaise P
Applied Surface Science, 259, 590, 2012
3 Swelling of 316L austenitic stainless steel induced by plasma nitriding
Stinville JC, Templier C, Villechaise P, Pichon L
Journal of Materials Science, 46(16), 5503, 2011
4 Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N
Abadias G, Koutsokeras LE, Dub SN, Tolmachova GN, Debelle A, Sauvage T, Villechaise P
Journal of Vacuum Science & Technology A, 28(4), 541, 2010
5 In situ tensile tests in SEM of sputtered CNx films deposited on Ti6Al4V substrate: effect of film thickness and plasma surface pretreatment
Villechaise P, Milhet X, Angleraud B, Fouquet V, Pichon L, Straboni A, Tessier R
Thin Solid Films, 482(1-2), 324, 2005
6 Influence of thin coatings deposited by a dynamic ion mixing technique on the fatigue life of titanium alloys
Peraud S, Villechaise P, Mendez J, Delafond J
Journal of Materials Science, 34(5), 1003, 1999
7 Determination of Young Modulus by a Resonant Technique Applied to 2 Dynamically Ion Mixed Thin-Films
Peraud S, Pautrot S, Villechaise P, Mazot P, Mendez J
Thin Solid Films, 292(1-2), 55, 1997