검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist Houle FA, Hinsberg WD, Morrison M, Sanchez MI, Wallraff G, Larson C, Hoffnagle J Journal of Vacuum Science & Technology B, 18(4), 1874, 2000 |
| 2 |
Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance Hinsberg W, Houle FA, Hoffnagle J, Sanchez M, Wallraff G, Morrison M, Frank S Journal of Vacuum Science & Technology B, 16(6), 3689, 1998 |
| 3 |
Correlation of Uviihs Resist Chemistry to Dissolution Rate Measurements Thackeray J, Fedynyshyn TH, Kang D, Rajaratnam MM, Wallraff G, Opitz J, Hofer D Journal of Vacuum Science & Technology B, 14(6), 4267, 1996 |
| 4 |
Thermal and Acid-Catalyzed Deprotection Kinetics in Candidate Deep-Ultraviolet Resist Materials Wallraff G, Hutchinson J, Hinsberg W, Houle F, Seidel P, Johnson R, Oldham W Journal of Vacuum Science & Technology B, 12(6), 3857, 1994 |
| 5 |
Simulation of Locally Enhanced 3-Dimensional Diffusion in Chemically Amplified Resists Zuniga M, Wallraff G, Tomacruz E, Smith B, Larson C, Hinsburg WD, Neureuther AR Journal of Vacuum Science & Technology B, 11(6), 2862, 1993 |