검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Comparison of Cl-2 and F-based dry etching for high aspect ratio Si microstructures etched with an inductively coupled plasma source Tian WC, Weigold JW, Pang SW Journal of Vacuum Science & Technology B, 18(4), 1890, 2000 |
| 2 |
Characterization of bending in single crystal Si beams and resonators Weigold JW, Juan WH, Pang SW, Borenstein JT Journal of Vacuum Science & Technology B, 17(4), 1336, 1999 |
| 3 |
Dry etching of deep Si trenches for released resonators in a Cl-2 plasma Weigold JW, Juan WH, Pang SW Journal of the Electrochemical Society, 145(5), 1767, 1998 |
| 4 |
Dry etching of Si field emitters and high aspect ratio resonators using an inductively coupled plasma source Rakhshandehroo MR, Weigold JW, Tian WC, Pang SW Journal of Vacuum Science & Technology B, 16(5), 2849, 1998 |
| 5 |
Etching and Boron-Diffusion of High-Aspect-Ratio Si Trenches for Released Resonators Weigold JW, Juan WH, Pang SW Journal of Vacuum Science & Technology B, 15(2), 267, 1997 |