검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet mask fabrication with high inspection contrast TaSiNx absorber stack Wasson JR, Weisbrod EJ, Lu B, Mangat PJS, Dauksher WJ, Resnick DJ, Sohn J, Engelstad R, Pettibone D Journal of Vacuum Science & Technology B, 21(6), 3086, 2003 |
| 2 |
Prediction of fabrication distortions in step and flash imprint lithography templates Martin CJ, Engelstad RL, Lovell EG, Resnick DJ, Weisbrod EJ Journal of Vacuum Science & Technology B, 20(6), 2891, 2002 |
| 3 |
Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks Lu B, Wasson JR, Weisbrod EJ, Masnyj Z, Mangat PJS, Nordquist K, Resnick D Journal of Vacuum Science & Technology B, 20(6), 3029, 2002 |
| 4 |
Thermal modeling of extreme ultraviolet and step and flash imprint lithography substrates during dry etch Weisbrod EJ, Dauksher WJ, Zhang D, Rauf S, Mangat PJS, Ventzek PLG, Smith KH, Clemens SB, Martin CJ, Engelstad RL Journal of Vacuum Science & Technology B, 20(6), 3047, 2002 |
| 5 |
Mechanical analysis of the PLASMAX particle removal process for optical and next-generation lithography masks Semke WH, Weisbrod EJ, Engelstad RL, Lovell EG, Festa JJ, Bailey JB Journal of Vacuum Science & Technology B, 18(6), 3221, 2000 |