검색결과 : 6건
No. | Article |
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1 |
Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films Kaltofen R, Sebald T, Schulte J, Weise G Thin Solid Films, 347(1-2), 31, 1999 |
2 |
Preparation, Structure and Properties of Mosx Films Weise G, Mattern N, Hermann H, Teresiak A, Bacher I, Bruckner W, Bauer HD, Vinzelberg H, Reiss G, Kreissig U, Mader M, Markschlager P Thin Solid Films, 298(1-2), 98, 1997 |
3 |
Low-energy ion bombardment effects in reactive rf magnetron sputtering of carbon nitride films Kaltofen R, Sebald T, Weise G Thin Solid Films, 308-309, 118, 1997 |
4 |
Development of Mechanical-Stress in Sputtered Cr3Si Films During Annealing Bruckner W, Weise G, Mattern N, Reiss G Journal of Materials Science Letters, 15(22), 1935, 1996 |
5 |
Plasma Diagnostic Studies to the Carbon Nitride Film Deposition by Reactive RF Magnetron Sputtering Kaltofen R, Sebald T, Weise G Thin Solid Films, 290-291, 112, 1996 |
6 |
X-Ray-Diffraction Studies of the Structure of Molybdenum Sulfide Thin-Films Doyle SE, Mattern N, Pitschke W, Weise G, Kraut D, Bauer HD Thin Solid Films, 245(1-2), 255, 1994 |