검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Lithography-free fabrication of sub-100 nm structures by self-aligned plasma etching of silicon dioxide layers and silicon Georgiev G, Muller-Wiegand M, Georgieva A, Ludolph K, Oesterschulze E Journal of Vacuum Science & Technology B, 21(4), 1361, 2003 |
| 2 |
Fabrication of subwavelength surface structures combining self-assembled masking layer with plasma etching techniques Oesterschulze E, Georgiev G, Muller-Wiegand M, Georgieva A, Ludolph K Journal of Vacuum Science & Technology B, 21(6), 2496, 2003 |
| 3 |
Technology to reduce the aperture size of microfabricated silicon dioxide aperture tips Vollkopf A, Georgiev G, Rudow O, Muller-Wiegand M, Oesterschulze E Journal of the Electrochemical Society, 148(10), G587, 2001 |
| 4 |
Time-dependent surface properties and wafer bonding of O-2-plasma-treated sillicon (100) surfaces Wiegand M, Reiche M, Gosele U Journal of the Electrochemical Society, 147(7), 2734, 2000 |
| 5 |
Process simulations in sealing technology Guth W, Malig C, Wiegand M Kunststoffe-Plast Europe, 89(5), 81, 1999 |