화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Laterally resolved ion-distribution functions at the substrate position during magnetron sputtering of indium-tin oxide films
Plagernann A, Ellmer K, Wiesemann K
Journal of Vacuum Science & Technology A, 25(5), 1341, 2007
2 Study of plasma polymerization from acetylene in pulsed r.f. discharges
Zajickova L, Rudakowski S, Becker HW, Meyer D, Valtr M, Wiesemann K
Thin Solid Films, 425(1-2), 72, 2003
3 Characterization of Plasma-Surface Contacts in Low-Pressure RF Discharges Using Ion Energy Analysis and Langmuir Probes
Flender U, Wiesemann K
Plasma Chemistry and Plasma Processing, 15(2), 123, 1995
4 Langmuir Probe Measurements During Plasma-Activated Chemical-Vapor-Deposition in the System Argon/Hydrogen/Dicyclopentadienyldimethylhafium
Spatenka P, Petig M, Wiesemann K, Suhr H
Plasma Chemistry and Plasma Processing, 15(3), 371, 1995