검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Experimental and theoretical study of ion distributions near 300 mu m tall steps on rf-biased wafers in high density plasmas Woodworth JR, Miller PA, Shul RJ, Abraham IC, Aragon BP, Hamilton TW, Willison CG, Kim D, Economou DJ Journal of Vacuum Science & Technology A, 21(1), 147, 2003 |
| 2 |
Electrical and plasma property measurements of a deep reactive ion etching Bosch process Abraham IC, Woodworth JR, Riley ME, Miller PA, Shul RJ, Willison CG Journal of Vacuum Science & Technology B, 21(3), 1112, 2003 |
| 3 |
Ion energy distributions at rf-biased wafer surfaces Woodworth JR, Abraham IC, Riley ME, Miller PA, Hamilton TW, Aragon BP, Shul RJ, Willison CG Journal of Vacuum Science & Technology A, 20(3), 873, 2002 |
| 4 |
Inductively coupled high-density plasma-induced etch damage of GaN MESFETs Shul RJ, Zhang L, Baca AG, Willison CG, Han J, Pearton SJ, Lee KP, Ren F Solid-State Electronics, 45(1), 13, 2001 |
| 5 |
Inductively coupled plasma-induced etch damage of GaN p-n junctions Shul RJ, Zhang L, Baca AG, Willison CG, Han J, Pearton SJ, Ren F Journal of Vacuum Science & Technology A, 18(4), 1139, 2000 |
| 6 |
GaN/AlGaN HBT fabrication Ren F, Han J, Hickman R, Van Hove JM, Chow PP, Klaassen JJ, LaRoche JR, Jung KB, Cho H, Cao XA, Donovan SM, Kopf RF, Wilson RG, Baca AG, Shul RJ, Zhang L, Willison CG, Abernathy CR, Pearton SJ Solid-State Electronics, 44(2), 239, 2000 |
| 7 |
Inductively coupled plasma etching of III-V antimonides in BCl3/Ar and Cl-2/Ar Zhang L, Lester LF, Shul RJ, Willison CG, Leavitt RP Journal of Vacuum Science & Technology B, 17(3), 965, 1999 |
| 8 |
Micromachined, reusable shadow mask for integrated optical elements grown by metalorganic chemical vapor deposition Peake GM, Zhang L, Li NY, Sarangan AM, Willison CG, Shul RJ, Hersee SD Journal of Vacuum Science & Technology B, 17(5), 2070, 1999 |
| 9 |
Selective inductively coupled plasma etching of group-III nitrides in Cl-2- and BCl3-based plasmas Shul RJ, Willison CG, Bridges MM, Han J, Lee JW, Pearton SJ, Abernathy CR, MacKenzie JD, Donovan SM, Zhang L, Lester LF Journal of Vacuum Science & Technology A, 16(3), 1621, 1998 |