화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 CO2 promotes penetration and removal of aqueous hydrocarbon surfactant cleaning solutions and silylation in low-k dielectrics with 3 nm pores
Keagy JA, Li Y, Green PF, Johnston KP, Weber F, Rhoad JT, Busch EL, Wolf PJ
Journal of Supercritical Fluids, 42(3), 398, 2007
2 Cleaning of patterned porous low-k dielectrics with water, carbon dioxide and ambidextrous surfactants
Keagy JA, Zhang XG, Johnston KP, Busch E, Weber F, Wolf PJ, Rhoad T
Journal of Supercritical Fluids, 39(2), 277, 2006
3 Water-in-carbon dioxide microemulsions for removing post-etch residues from patterned porous low-k dielectrics
Zhang XG, Pham JQ, Martinez HJ, Wolf PJ, Green PF, Johnston KP
Journal of Vacuum Science & Technology B, 21(6), 2590, 2003