검색결과 : 18건
| No. | Article |
|---|---|
| 1 |
Fabrication of thin-film thermopile micro-bridge with XeF2 etching process Yoo KP, Min NK Thin Solid Films, 516(11), 3586, 2008 |
| 2 |
Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition Iliescu C, Chen BT, Wei JS, Pang AJ Thin Solid Films, 516(16), 5189, 2008 |
| 3 |
Enhancement of silicon etching rate in XeF2 ambient in the presence of activated polymer Knizikevicius R Applied Surface Science, 228(1-4), 227, 2004 |
| 4 |
Silicon etch rate enhancement by traces of metal Sebel PGM, Hermans LJF, Beijerinck HCW Journal of Vacuum Science & Technology A, 17(3), 755, 1999 |
| 5 |
Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence Sebel PGM, Hermans LJF, Beijerinck HCW Journal of Vacuum Science & Technology A, 17(6), 3368, 1999 |
| 6 |
XeF2 center dot 2CrF(4) and XeF5+CrF5- : Syntheses, crystal structures, and some properties Lutar K, Borrmann H, Zemva B Inorganic Chemistry, 37(12), 3002, 1998 |
| 7 |
Surface diffusion model accounting for the temperature dependence of tungsten etching characteristics in a SF6 magnetoplasma Bounasri F, Pelletier J, Moisan M, Chaker M Journal of Vacuum Science & Technology B, 16(3), 1068, 1998 |
| 8 |
Ion-Assisted Si/Xef2-Etching - Influence of Ion/Neutral Flux Ratio and Ion Energy Vugts MJ, Hermans LJ, Beijerinck HC Journal of Vacuum Science & Technology A, 14(4), 2138, 1996 |
| 9 |
Si/Xef2 Etching - Temperature-Dependence Vugts MJ, Verschueren GL, Eurlings MF, Hermans LJ, Beijerinck HC Journal of Vacuum Science & Technology A, 14(5), 2766, 1996 |
| 10 |
Si/Xef2 Etching - Reaction Layer Dynamics and Surface Roughening Vugts MJ, Eurlings MF, Hermans LJ, Beijerinck HC Journal of Vacuum Science & Technology A, 14(5), 2780, 1996 |