검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Autonomously Substitutable Organosilane Thin Films Based on Dynamic Covalent Diarylbibenzofuranone Units Yoneyama R, Sato T, Imato K, Kosuge T, Ohishi T, Higaki Y, Takahara A, Otsuka H Chemistry Letters, 45(1), 36, 2016 |
| 2 |
Copper blocking ability of nitrogen-incorporated silicon oxide film Takeda K, Ryuzaki D, Mine T, Hinode K, Yoneyama R Journal of Vacuum Science & Technology B, 21(4), 1323, 2003 |
| 3 |
Oxygen plasma resistance of low-k organosilica glass films Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K Electrochemical and Solid State Letters, 4(3), G31, 2001 |
| 4 |
Direct resist removal process from copper-exposed vias for low-parasitic-capacitance interconnects Furusawa T, Sakuma N, Ryuzaki D, Kondo S, Takeda K, Machida S, Yoneyama R, Hinode K Journal of the Electrochemical Society, 148(4), G190, 2001 |
| 5 |
Heat and moisture resistance of siloxane-based low-dielectric-constant materials Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K Journal of the Electrochemical Society, 148(9), F175, 2001 |