1 |
Charge loss in WSi2 nanocrystals nonvolatile memory with SiO2/Si3N4/SiO2 tunnel layer Lee DU, Lee HJ, Kim EK, You HW, Cho WJ Current Applied Physics, 11(2), E6, 2011 |
2 |
Multi-layer stacked OHA and AHA tunnel barriers for charge trap flash non-volatile memory application Son JW, You HW, Cho WJ Current Applied Physics, 11(2), E10, 2011 |
3 |
Electrical characteristics of a ZrO2/SiO2 modified tunnel barrier for low-temperature non-volatile memory You HW, Cho WJ Thin Solid Films, 519(10), 3397, 2011 |
4 |
Electrical properties of HfO2 charge trap flash memory with SiO2/HfO2/Al2O3 engineered tunnel layer Oh SM, You HW, Kim KS, Lee YH, Cho WJ Current Applied Physics, 10(1), E18, 2010 |
5 |
Electrical properties of WSi2 nanocrystal memory with SiO2/Si3N4/SiO2 tunnel barriers Seo KB, Lee DU, Han SJ, Kim EK, You HW, Cho WJ Current Applied Physics, 10(1), E5, 2010 |
6 |
Thickness dependence of high-k materials on the characteristics of MAHONOS structured charge trap flash memory You HW, Oh SM, Cho WJ Thin Solid Films, 518(22), 6460, 2010 |
7 |
Microstructure and dielectric properties of Li2CO3 doped 0.7(Ba,Sr)TiO3-0.3MgO ceramics You HW, Koo SM, Ha JG, Koh JH, Park JY Current Applied Physics, 9(4), 875, 2009 |
8 |
Synthesis of LiCoO2 by mechanical alloying You HW, Lee HY, Jang SW, Shin KC, Lee SM, Lee JK, Lee SJ, Baik HK, Rhee DS Journal of Materials Science Letters, 17(11), 931, 1998 |