검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Boron diffusion in compressively stressed float zone silicon induced by Si3N4 films Zaitsu Y, Shimizu T, Takeuchi J, Matsumoto S, Yoshida M, Abe T, Arai E Journal of the Electrochemical Society, 145(1), 258, 1998 |
| 2 |
Effect of Stress in the Deposited Silicon-Nitride Films on Boron-Diffusion of Silicon Osada K, Zaitsu Y, Matsumoto S, Yoshida M, Arai E, Abe T Journal of the Electrochemical Society, 142(1), 202, 1995 |