검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Effects of ion bombardment on the structural and optical properties in hydrogenated silicon thin films Memchout SA, Bouizem Y, Sib JD, Belfedal A, Kebab A, Benlakehal D, Chahed L, Zellama K Thin Solid Films, 594, 138, 2015 |
| 2 |
Influence of the radio-frequency power on the physical and optical properties of plasma polymerized cyclohexane thin films Manaa C, Lejeune M, Kouki F, Durand-Drouhin O, Bouchriha H, Zellama K, Benlahsen M Thin Solid Films, 560, 55, 2014 |
| 3 |
Hydrogen related crystallization in intrinsic hydrogenated amorphous silicon films prepared by reactive radiofrequency magnetron sputtering at low temperature Senouci D, Baghdad R, Belfedal A, Chahed L, Portier X, Charvet S, Kim KH, Cabarrocas PRI, Zellama K Thin Solid Films, 522, 186, 2012 |
| 4 |
Deposition of nanocryctalline silicon thin films: Effect of total pressure and substrate temperature Baghdad R, Benlakehal D, Portier X, Zellama K, Charvet S, Sib JD, Clin M, Chahed L Thin Solid Films, 516(12), 3965, 2008 |
| 5 |
Comparative study of the structure of a-CNx and a-CNx : H films using NEXAFS, XPS and FT-IR analysis Bouchet-Fabre B, Zellama K, Godet C, Ballutaud D, Minea T Thin Solid Films, 482(1-2), 156, 2005 |
| 6 |
Spectroscopic study using FTIR, Raman, XPS and NEXAFS of carbon nitride thin films deposited by RF magnetron sputtering Bouchet-Fabre B, Marino E, Lazar G, Zellama K, Clin M, Ballutaud D, Abel F, Godet C Thin Solid Films, 482(1-2), 167, 2005 |
| 7 |
Impurities and related microstructure in nanocrystalline silicon films grown by radiofrequency magnetron sputtering Goncalves C, Zeinert A, Charvet S, Lejeune M, Grosman A, von Bardeleben HJ, Zellama K Thin Solid Films, 451-52, 370, 2004 |
| 8 |
Nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering Goncalves C, Charvet S, Zeinert A, Clin M, Zellama K Thin Solid Films, 403-404, 91, 2002 |
| 9 |
Hydrogenated amorphous silicon deposited by DC magnetron sputtering at high temperature Cherfi R, Farhi G, Aoucher M, Zellama K Thin Solid Films, 383(1-2), 192, 2001 |
| 10 |
Effect of annealing on the structural and electrical properties of d.c. multipolar plasma deposited a-C : H films Clin M, Benlahsen M, Zeinert A, Zellama K, Naud C Thin Solid Films, 372(1-2), 60, 2000 |