화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 SiGe channels for V-T control of high-k metal gate transistors for 32 nm complementary metal oxide semiconductor technology and beyond
Reichel C, Schoenekess J, Kronholz S, Beernink G, Zeun A, Dietel A, Kammler T
Thin Solid Films, 520(8), 3170, 2012
2 Control of topography and morphology for channel SiGe by in-situ HCl etching for future CMOS technologies with high-K metal gate
Reichel C, Kronholz S, Kammler T, Zeun A, Beernink G
Solid-State Electronics, 60(1), 134, 2011