화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Phase transformation of tantalum on different dielectric films with plasma treatment
Huang CC, Wang YL, Chang SC, Hwang GJ, Huang JL
Thin Solid Films, 498(1-2), 286, 2006
2 The influence of temperature and dielectric materials on stress induced voiding in Cu dual damascene interconnects
Gan ZG, Shao W, Mhaisalkar SG, Chen Z, Li HY
Thin Solid Films, 504(1-2), 161, 2006
3 Characterization of tetra methyl cyclo tetra siloxanes-based low-k dielectric film
Widodo J, Lu W, Mhaisalkar SG, Hsia LC, Tan PY, Shen L, Zeng KY
Thin Solid Films, 462-63, 213, 2004