검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Increase of cleaning rate and reduction in global warming effect during C4F8O/O-2 remote plasma cleaning of silicon nitride by adding NO and N2O Oh CH, Lee NE, Kim JH, Yeom GY, Yoon SS, Kwon TK Thin Solid Films, 435(1-2), 264, 2003 |
| 2 |
In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si : H solar cells Masuda A, Ishibashi Y, Uchida K, Kamesaki K, Izumi A, Matsumura H Solar Energy Materials and Solar Cells, 74(1-4), 373, 2002 |
| 3 |
Novel chamber cleaning method using atomic hydrogen generated by hot catalyzer Uchida K, Izumi A, Matsumura H Thin Solid Films, 395(1-2), 75, 2001 |