화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Bubble points of the binary mixtures formed by ethylbenzene with some chloroaliphatics and substituted benzenes at p=94.7 kPa
Prasad TEV, Srinivas MY, Prasad DHL
Journal of Chemical Thermodynamics, 38(10), 1186, 2006
2 Bubble temperature measurements on the binary mixtures of sec-butanol with chloroethanes and chloroethylenes at 94.6 kPa
Prasad TEV, Prasad DHL, Krishna VBV
Chemical Engineering Communications, 192(2), 168, 2005
3 Bubble points of some binary mixtures formed by o-cresol at 95.75 kPa
Prasad TEV, Harish G, Krupavaram N, Prasad S, Jaiswal A, Prasad DHL
Fluid Phase Equilibria, 238(1), 45, 2005
4 Bubble temperature measurements on the binary mixtures formed by 1,2-dimethylbenzene with some chloroethanes and chloroethylenes at 95.8 KPA
Prasad TEV, Prasad DHL, Babu JK, Banarjee S
Chemical Engineering Communications, 191(10), 1323, 2004
5 Boiling temperature measurements on the binary mixtures formed by dimethyl carbonate with some chloroethanes and chloroethylenes at 95.8 kPa
Prasad TEV, Banerjee S, Babu JK, Prasad DHL
Fluid Phase Equilibria, 218(2), 291, 2004
6 Boiling temperature measurements on the binary mixtures formed by tert-butanol with some chloroethanes and chloroethylenes at 94.6 kPa
Prasad TEV, Sankar B, Kumar RP, Prasad DHL
Fluid Phase Equilibria, 213(1-2), 147, 2003
7 Boiling temperature measurements on the binary mixtures formed by acetonitrile with some chloroethanes and chloroethylenes at 94.6 kPa
Prasad TEV, Kumar AS, Prasad DHL
Fluid Phase Equilibria, 201(1), 47, 2002
8 The unimolecular dissociation of vinylcyanide: A theoretical investigation of a complex multichannel reaction
Derecskei-Kovacs A, North SW
Journal of Chemical Physics, 110(6), 2862, 1999
9 Primary and secondary processes in the 193 nm photodissociation of vinyl chloride
Blank DA, Sun WZ, Suits AG, Lee YT, North SW, Hall GE
Journal of Chemical Physics, 108(13), 5414, 1998
10 Photodissociation of acrylonitrile at 193 nm : A photofragment translational spectroscopy study using synchrotron radiation for product photoionization
Blank DA, Suits AG, Lee YT, North SW, Hall GE
Journal of Chemical Physics, 108(14), 5784, 1998