| 1 |
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
Karthikeyan S, Hill AE, Pilkington RD
Thin Solid Films, 550, 140, 2014 |
| 2 |
Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications
Karthikeyan S, Hill AE, Pilkington RD
Thin Solid Films, 520(1), 266, 2011 |
| 3 |
Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol-gel and grafting in acetone degradation
Parvulescu VI, Visinescu C, Parvulescu V, Marcu V, Levy F
Catalysis Today, 118(3-4), 433, 2006 |
| 4 |
The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering
Eufinger K, Janssen EN, Poelman H, Poelman D, De Gryse R, Marin GB
Thin Solid Films, 515(2), 425, 2006 |
| 5 |
The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
Eufinger K, Tomaszewski H, Depla D, Poelman H, Poelman D, De Gryse R
Thin Solid Films, 515(2), 683, 2006 |
| 6 |
Study on In2O3-SnO2 transparent and conductive films prepared by d.c. sputtering using high density ceramic targets
Utsumi K, Iigusa H, Tokumaru R, Song PK, Shigesato Y
Thin Solid Films, 445(2), 229, 2003 |
