| 1 |
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma
Bulou S, Le Brizoual L, Miska P, de Poucques L, Hugon R, Belmahi M, Bougdira J
Thin Solid Films, 520(1), 245, 2011 |
| 2 |
Influence of nitrogen incorporation on the electrical properties of MPCVD diamond films growth in CH4-CO2-N-2 and CH4-H-2-N-2 gas mixtures (vol 374, pg 27, 2000)
Elmazria O, Bougdira J, Chatei H, De Poucques L, Remy M, Alnot P
Thin Solid Films, 519(4), 1486, 2010 |
| 3 |
Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil
Imbert JC, de Poucques L, Boisse-Laporte C, Bretagne J, Hugon MC, Pagnon D, Pitach P, Teule-Gay L, Touzeau M
Thin Solid Films, 516(15), 4700, 2008 |
| 4 |
Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems
Leroy O, de Poucques L, Boisse-Laporte C, Ganciu M, Teule-Gay L, Touzeau M
Journal of Vacuum Science & Technology A, 22(1), 192, 2004 |
