검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |
| 2 |
Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope Cho SH, Yang F, Sun GR, Eller MJ, Clark C, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Macromolecular Rapid Communications, 35(4), 437, 2014 |