검색결과 : 614건
No. | Article |
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1 |
Characterization of Reversed Arc Hydrocarbon Plasma in Material Processing Avtaeva S, Gorokhovsky V Plasma Chemistry and Plasma Processing, 41(3), 815, 2021 |
2 |
How Hydrogen Admixture Changes Plasma Jet Characteristics in Spray Processes at Low Pressure Mauer G Plasma Chemistry and Plasma Processing, 41(1), 109, 2021 |
3 |
Plasma-Chemical Synthesis of Lead Sulphide Thin Films for Near-IR Photodetectors Mochalov L, Logunov A, Prokhorov I, Sazanova T, Kudrin A, Yunin P, Zelentsov S, Letnianchik A, Starostin N, Boreman G, Vorotyntsev V Plasma Chemistry and Plasma Processing, 41(1), 493, 2021 |
4 |
Electrochemical Lithiation and Delithiation of Si(100) Single-crystal Surface Aoki M, Omachi A, Smaran KS, Ohama A, Uchino Y, Uosaki K, Kondo T Chemistry Letters, 49(1), 91, 2020 |
5 |
Spatial distribution of spectrally emitting species in a nitromethane-air diffusion flame and comparison with kinetic models Sheehe SL, Jackson SI Combustion and Flame, 213, 184, 2020 |
6 |
Coated stainless steel as bipolar plate material for anion exchange membrane fuel cells (AEMFCs) Proch S, Stenstrom M, Eriksson L, Andersson J, Sjoblom G, Jansson A, Westlinder J International Journal of Hydrogen Energy, 45(2), 1313, 2020 |
7 |
Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O-2 in an Industrial-Scale Reactor Gosar Z, Kovac J, Mozetic M, Primc G, Vesel A, Zaplotnik R Plasma Chemistry and Plasma Processing, 40(1), 25, 2020 |
8 |
Microwave Plasma Jet in Water: Effect of Water Electrical Conductivity on Plasma Characteristics Hamdan A, Profili J, Cha MS Plasma Chemistry and Plasma Processing, 40(1), 169, 2020 |
9 |
Electrical and Optical Characterization of Acetylene RF CCP for Synthesis of Different Forms of Hydrogenated Amorphous Carbon Films Aldeeb MA, Morgan N, Abouelsayed A, Amin KM, Hassaballa S Plasma Chemistry and Plasma Processing, 40(1), 387, 2020 |
10 |
Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture Liu Z, Huang BD, Zhu WC, Zhang C, Tu X, Shao T Plasma Chemistry and Plasma Processing, 40(4), 937, 2020 |