| 1 |
Induction of tin pest for cleaning tin-drop contaminated optics
Bowering N
Materials Chemistry and Physics, 198, 236, 2017 |
| 2 |
Mechanismand model of atomic hydrogen cleaning for different types of carbon contamination on extreme ultraviolet multilayers
Song Y, Lu QP, Gong XP
Thin Solid Films, 612, 96, 2016 |
| 3 |
Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning
Ashby PD, Olynick DL, Ogletree DF, Naulleau PP
Advanced Materials, 27(38), 5813, 2015 |
| 4 |
Transportation of hydrogen radicals for cleaning extreme ultraviolet lithography optics
Kuroki Y, Funakoshi N, Nishiyama I, Izumi A
Thin Solid Films, 575, 110, 2015 |
| 5 |
Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography
Di Lazzaro P, Bollanti S, Flora F, Mezi L, Murra D, Torre A
Applied Surface Science, 272, 13, 2013 |
| 6 |
Full 3D Monte Carlo simulation of pit-type defect evolution during extreme ultraviolet lithography multilayer deposition
Spivey RF, Teki R, Lu TM
Thin Solid Films, 540, 173, 2013 |
| 7 |
Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)
Jung HY, Park YR, Lee HJ, Lee NE, Jeong CY, Ahn J
Thin Solid Films, 517(14), 3938, 2009 |
| 8 |
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
Madey TE, Faradzhev NS, Yakshinskiy BV, Edwards NV
Applied Surface Science, 253(4), 1691, 2006 |
| 9 |
Etching characteristics of Ta and TaN usingCl(2)/Ar inductively coupled plasma
Shin MH, Na SW, Lee NE, Ahn JH
Thin Solid Films, 506, 230, 2006 |
| 10 |
Stress, microstructure, and stability of Mo/Si, W/Si, and Mo/C multilayer films
Windt DL
Journal of Vacuum Science & Technology A, 18(3), 980, 2000 |
