| 1 |
Er0.4Bi1.6O3 thin films in situ crystallized at low temperature onto the Gd0.1Ce0.9O1.95 bulk electrolytes via Facing Target Sputtering
Jeung JN, Eom JH, Park BJ, Kim SD, Yoon SG
Current Applied Physics, 17(5), 751, 2017 |
| 2 |
Utilization of AZO/Au/AZO multilayer electrodes instead of FTO for perovskite solar cells
Dang TV, Pammi SVN, Choi J, Yoon SG
Solar Energy Materials and Solar Cells, 163, 58, 2017 |
| 3 |
Stoichiometric p-type Cu2O thin films prepared by reactive sputtering with facing target
Ahn JS, Pode R, Lee KB
Thin Solid Films, 623, 121, 2017 |
| 4 |
On-axis 스퍼터링과 FTS 공정으로 증착한 ZTO 박막트랜지스터의 특성
이세희, 윤순길
Korean Journal of Materials Research, 26(12), 676, 2016 |
| 5 |
Enhanced Permeability Property of Silicon Oxide Thin Films Deposited by Facing Target Sputtering System for OLED Application
Jin I, Kim D, Choi M, Sohn S, Kim H
Molecular Crystals and Liquid Crystals, 626(1), 238, 2016 |
| 6 |
Plasma damage free sputtering of Ti-doped In2O3 film on Ag nanowire network for transparent and flexible electrodes
Seo KW, Kim HK
Thin Solid Films, 591, 301, 2015 |
| 7 |
Thickness Dependence of WO3-x Thin Films for Electrochromic Device Application
Kim MH, Choi HW, Kim KH
Molecular Crystals and Liquid Crystals, 598(1), 54, 2014 |
| 8 |
Characteristics of Ga-Al Doped Zinc Oxide Thin Films Deposited by Facing Targets Sputtering
Lee JS, Jung YS, Bark CW, Kim KH
Molecular Crystals and Liquid Crystals, 600(1), 56, 2014 |
| 9 |
Preparation of Transparent Metal Films, Gallium-Doped Zinc-Oxide (Ga2O3)(x) (ZnO)(100-x) Films by Using Facing Target Sputtering System
Kim D, Seo SB, Sohn SY, Han YS, Kim HM
Molecular Crystals and Liquid Crystals, 601(1), 245, 2014 |
| 10 |
Working Pressure Dependence of WO3-x Thin Films Prepared by Reactive Facing Targets Sputtering
Kim MH, Bark CW, Choi HW, Kim KH
Molecular Crystals and Liquid Crystals, 602(1), 185, 2014 |
