| 1 |
Low friction and wear behaviour of non-hydrogenated DLC (a-C) sliding against fluorinated tetrahedral amorphous carbon (ta-C-F) at elevated temperatures
Bhowmick S, Khan MZU, Banerji A, Lukitsch MJ, Alpas AT
Applied Surface Science, 450, 274, 2018 |
| 2 |
Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition
Yi JW, Lee YH, Farouk B
Thin Solid Films, 423(1), 97, 2003 |
| 3 |
Structure and mechanical properties of PACVD fluorinated amorphous carbon films
Bottani CE, Lamperti A, Nobili L, Ossi PM
Thin Solid Films, 433(1-2), 149, 2003 |
| 4 |
Influence of thermal annealing on bonding structure and dielectric properties of fluorinated amorphous carbon film
Ning ZY, Cheng SH, Yang SD
Current Applied Physics, 2(6), 439, 2002 |
| 5 |
Structural and electrical properties of co-sputtered fluorinated amorphous carbon film
Jung HS, Park HH
Thin Solid Films, 420-421, 248, 2002 |
| 6 |
Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma
Yi JW, Lee YH, Farouk B
Thin Solid Films, 374(1), 103, 2000 |
| 7 |
Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane
Labelle CB, Gleason KK
Journal of Applied Polymer Science, 74(10), 2439, 1999 |
| 8 |
Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2
Labelle CB, Gleason KK
Journal of Vacuum Science & Technology A, 17(2), 445, 1999 |
| 9 |
Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane
Labelle CB, Karecki SM, Reif R, Gleason KK
Journal of Vacuum Science & Technology A, 17(6), 3419, 1999 |
