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Mid-infrared type-I InAs/In0.83Al0.17As quantum wells grown on GaP and InP by gas source molecular beam epitaxy Huang WG, Gu Y, Chen XY, Zhang J, Gong Q, Huang H, Ma YJ, Zhang YG Journal of Crystal Growth, 512, 61, 2019 |
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Molecular beam epitaxy growth of GaN films on a tungsten carbide/Si template Cho S, Choi S, Cho Y, Lee S, Lee M, Chang J Thin Solid Films, 649, 232, 2018 |
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Interface roughness scattering in InGaAs/InAlAs double quantum wells grown on (100) and (411)A InP substrates at different growth temperatures Alcer D, Semtsiv MP, Masselink WT Journal of Crystal Growth, 477, 110, 2017 |
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InGaAsBi materials grown by gas source molecular beam epitaxy Ai LK, Zhou SX, Qi M, Xu AH, Wang SM Journal of Crystal Growth, 477, 135, 2017 |
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Microstructural properties of GaN grown on a Si(110) substrate by gas-source molecular beam epitaxy: Dependence on the ammonia flux Lee JH, Ryu H, Ahn SJ, Noh YK, Oh JE, Kim YH Current Applied Physics, 15(3), 232, 2015 |
6 |
InP/InGaAs/InP DHBT structures with high carbon-doped base grown by gas source molecular beam epitaxy Teng T, Xu AH, Ai LK, Sun H, Qi M Journal of Crystal Growth, 378, 618, 2013 |
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Quantum dot lasers grown by gas source molecular-beam epitaxy Gong Q, Chen P, Li SG, Lao YF, Cao CF, Xu CF, Zhang YG, Feng SL, Ma CH, Wang HL Journal of Crystal Growth, 323(1), 450, 2011 |
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InP/InGaAs/InP DHBT structures with graded composition base grown by gas source molecular beam epitaxy Teng T, Ai LK, Xu AH, Sun H, Zhu FY, Qi M Journal of Crystal Growth, 323(1), 525, 2011 |
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Gas-source molecular beam epitaxy of Si(111) on Si(110) substrates by insertion of 3C-SiC(111) interlayer for hybrid orientation technology Bantaculo R, Saitoh E, Miyamoto Y, Handa H, Suemitsu M Thin Solid Films, 520(2), 730, 2011 |
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In As/GaAs quantum dot lasers grown by gas-source molecular-beam epitaxy Yang HD, Gong Q, Li SG, Cao CF, Xu CF, Chen P, Feng SL Journal of Crystal Growth, 312(23), 3451, 2010 |