| 1 |
The microstructure evolution of hydrogenated microcrystalline germanium promoted by power gradient method
Wang XY, Ni J, Li C, Sun XX, Li ZL, Cai HK, Li J, Zhang JJ
Journal of Crystal Growth, 455, 136, 2016 |
| 2 |
Reduction of amorphous incubation layer by HCl addition during deposition of microcrystalline silicon by hot-wire chemical vapor deposition
Chung YB, Lee DK, Lim JS, Hwang NM
Solar Energy Materials and Solar Cells, 95(1), 211, 2011 |
| 3 |
Microstructure characterization of microcrystalline silicon thin films deposited by very high frequency plasma-enhanced chemical vapor deposition by spectroscopic ellipsometry
Zhang H, Zhang XD, Wei CC, Sun J, Geng XH, Xiong SZ, Zhao Y
Thin Solid Films, 520(2), 861, 2011 |
| 4 |
Nanocrystalline silicon films deposited with a modulated hydrogen dilution ratio by catalytic CVD at 200 degrees C
Kim TH, Lee KM, Hwang JD, Hong WS
Current Applied Physics, 9(2), E108, 2009 |
| 5 |
High quality microcrystalline Si films by hydrogen dilution profile
Gu JH, Zhu MF, Wang LJ, Liu FZ, Zhou BQ, Ding K, Li GH
Thin Solid Films, 515(2), 452, 2006 |
