| 1 |
Modeling the effect of power on the growth properties of microcrystalline silicon films in the high-pressure depletion regime
Li R, Chen XP, Chen YS, Hao XL, Lu JX, Yang SE
Thin Solid Films, 562, 140, 2014 |
| 2 |
The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method
Chen YS, Chen XP, Hao XL, Lu JX, Yang SE
Applied Surface Science, 270, 737, 2013 |
| 3 |
Modeling and experiments of microcrystalline silicon film deposited via VHF-PECVD
Chen YS, Chen XP, Jiao YC, Hao XL, Lu JX, Yang SE
Solar Energy, 94, 155, 2013 |
| 4 |
Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition
Muta H, Mizuno K, Nishida S, Kuribayashi S
Thin Solid Films, 523, 41, 2012 |
| 5 |
Effect of structure variation on thermal conductivity of hydrogenated silicon film
Li SB, Jiang YD, Wu ZM, Wu J, Ying ZH, Wang ZM, Li W, Salamo GJ
Applied Surface Science, 257(20), 8326, 2011 |
| 6 |
Study on the mechanism of rapid solid-phase recrystallization of hydrogenated amorphous silicon film by rapid thermal processing
Gao XY, Feng HL, Lin QG, Zhang LW, Liu XW, Zhao JT, Liu YF, Chen YS, Gu JH, Yang SE, Li WQ, Lu JX
Thin Solid Films, 518(15), 4473, 2010 |
| 7 |
Optical emission spectroscopy investigation on very high frequency plasma and its glow discharge mechanism during the microcrystalline silicon deposition
Yang HD, Wu CY, Huang J, Ding RQ, Zhao Y, Geng XH, Xiong SZ
Thin Solid Films, 472(1-2), 125, 2005 |
