| 1 |
Pinus sylvestris L. needle surface wettability parameters as indicators of atmospheric environment pollution impacts: Novel contact angle hysteresis methodology
Pogorzelski SJ, Rochowski P, Szurkowski J
Applied Surface Science, 292, 857, 2014 |
| 2 |
Low-temperature oxidation of SiC surfaces by supercritical water oxidation
Futatsuki T, Oe T, Aoki H, Komatsu N, Kimura C, Sugino T
Applied Surface Science, 256(22), 6512, 2010 |
| 3 |
Recent approaches to highly hydrophobic textile surfaces
Bahners T, Textor T, Opwis K, Schollmeyer E
Journal of Adhesion Science and Technology, 22(3-4), 285, 2008 |
| 4 |
Fractals and superstructures in gadolinia thin film morphology: Influence of process variables on their characteristic parameters
Sahoo NK, Thakur S, Tokas RB
Thin Solid Films, 503(1-2), 85, 2006 |
| 5 |
Characterization of microroughness parameters in gadolinium oxide thin films: A study based on extended power spectral density analyses
Senthilkumar M, Sahoo NK, Thakur S, Tokas RB
Applied Surface Science, 252(5), 1608, 2005 |
| 6 |
Synthetic diamond electrodes: The effect of surface microroughnesson the electrochemical properties of CVD diamond thin films on titanium
Pleskov YV, Evstefeeva YE, Krotova MD, Lim PY, Shih HC, Varnin VP, Teremetskaya IG, Vlasov II, Ralchenko VG
Journal of Applied Electrochemistry, 35(9), 857, 2005 |
| 7 |
Adhesion improvement of electroless copper to a polyimide film substrate by combining surface microroughening and imide ring cleavage
Wang ZL, Furuya A, Yasuda K, Ikeda H, Baba T, Hagiwara M, Toki S, Shingubara S, Kubota H, Ohmi T
Journal of Adhesion Science and Technology, 16(8), 1027, 2002 |
| 8 |
Effects of initial nitridation on the characteristics of SiC-SiO2 interfaces
Cheong KY, Dimitrijev S, Han J
Materials Science Forum, 433-4, 583, 2002 |
| 9 |
Leakage current distribution in ultrathin oxide on silicon surface with step/terrace structures
Murata M, Tokuda N, Hojo D, Yamabe K
Thin Solid Films, 414(1), 56, 2002 |
| 10 |
Corrosion rate of n- and p-silicon substrates in HF, HF+HCl, and HF+NH4F aqueous solutions
Bertagna V, Erre R, Rouelle F, Chemla M
Journal of the Electrochemical Society, 146(1), 83, 1999 |
