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| No. | Article |
|---|---|
| 1 |
Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template Sun ZW, Chen ZB, Zhang WX, Choi J, Huang CL, Jeong GJ, Coughlin EB, Hsu YT, Yang XM, Lee KY, Kuo DS, Xiao SG, Russell TP Advanced Materials, 27(29), 4364, 2015 |