| 1 |
Synthesis of multifunctional monomers for patterning pixel define layer of organic light emitting diode
Park SH, Shi G, Seo DM, Kim M, Kim J, Park LS
Molecular Crystals and Liquid Crystals, 663(1), 168, 2018 |
| 2 |
Microbowl-arrayed surface generated by EBL of negative-tone SU-8 for highly adhesive hydrophobicity
Li XM, Shao JY, Ding YC, Tian HM
Applied Surface Science, 307, 365, 2014 |
| 3 |
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Bauer WAC, Neuber C, Ober CK, Schmidt HW
Advanced Materials, 23(45), 5404, 2011 |
| 4 |
Removal of Negative-tone Novolak Chemical Amplification Resist by Chemicals
Kono A, Yada K, Horibe H, Ota H, Yanagi M
KAGAKU KOGAKU RONBUNSHU, 36(6), 589, 2010 |
| 5 |
Synthesis of succinylated poly(4-hydroxystyrene) and its application for negative-tone photoresist
Cho H, Kim J, Patil P, Kim JY, Kim TH
Journal of Applied Polymer Science, 103(6), 3560, 2007 |
| 6 |
Polymers from aryl cyclic sulfonium zwitterions-photosensitive materials cast from and developed in water
So YH, Schmidt DL, Bishop MT, Miller DR, Smith PB, Radler MJ, Magyar M, Kaliszewski BL
Journal of Polymer Science Part A: Polymer Chemistry, 38(8), 1283, 2000 |
| 7 |
Photoresists with reduced environmental impact: Water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate
Havard JM, Vladimirov N, Frechet JMJ, Yamada S, Willson CG, Byers JD
Macromolecules, 32(1), 86, 1999 |
