화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Oxygen Atom Neutral Beam Assisted Deposited Al2O3 and its Application to the Fabrication of Zinc Oxide Thin Film Transistor
Cho ES, Cho J, Kwon SJ
Molecular Crystals and Liquid Crystals, 550, 119, 2011
2 Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process
Jang JN, Lee YJ, Lee JY, Jang YS, Hong M, Oh KS, Yoo SJ, Kim D, Lee B, Jang WG
Thin Solid Films, 519(7), 2098, 2011