검색결과 : 32건
| No. | Article |
|---|---|
| 1 |
Fabrication of flexible organic thin-film transistors based on negative acting photosensitive novolak polymer as an organic gate insulator Xie YT, Wang DP, Cui W, Wang L, Guan C, Chen GP, He F Molecular Crystals and Liquid Crystals, 664(1), 135, 2018 |
| 2 |
Study of Chemical Structure and Removal of Positive-Tone Novolak Resist Having Various Prebake Temperature using Wet Ozone Angata Y, Goto Y, Takahashi S, Kono A, Koike K, Nishiyama I, Kamoto R, Horibe H KAGAKU KOGAKU RONBUNSHU, 39(2), 144, 2013 |
| 3 |
Concomitant cationic polymerization of a hybrid monomer and an epoxy resin Arnebold A, Schorsch O, Beckmann J, Hartwig A Reactive & Functional Polymers, 73(12), 1625, 2013 |
| 4 |
Optical properties of bi-doped epoxy novolak resin containing Ce, Dy, and Y ions Prajzler V, Lyutakov O, Huttel I, Spirkova J, Oswald J, Machovic V, Jerabek V Journal of Applied Polymer Science, 125(1), 710, 2012 |
| 5 |
Preparation and characterization of novolak phenol formaldehyde resin from liquefied brown-rotted wood Li GY, Hse CY, Qin TF Journal of Applied Polymer Science, 125(4), 3142, 2012 |
| 6 |
Degradable and chemically recyclable epoxy resins containing acetal linkages: Synthesis, properties, and application for carbon fiber-reinforced plastics Hashimoto T, Meiji H, Urushisaki M, Sakaguchi T, Kawabe K, Tsuchida C, Kondo K Journal of Polymer Science Part A: Polymer Chemistry, 50(17), 3674, 2012 |
| 7 |
Properties of Epoxy Novolak Resin Layers Doped with Bismuth for Photoluminescence Near 1300 nm Prajzler V, Lyutakov O, Huttel I, Spirkova J, Oswald J, Machovic V, Jerabek V Journal of Applied Polymer Science, 117(3), 1608, 2010 |
| 8 |
Effects of Diazonaphthoquinone Groups on Photosensitive Coating Zhou HH, Zou YQ, Song YL Journal of Applied Polymer Science, 117(4), 2360, 2010 |
| 9 |
Properties of Compression-Molded Plates Made from Wood Powders Impregnated with Liquefied Wood-based Novolak-Type Phenol-Formaldehyde Resins Lee WJ, Wu YH, Wu CC, Chang KC, Tseng IM Journal of Applied Polymer Science, 118(6), 3471, 2010 |
| 10 |
Removal of Negative-tone Novolak Chemical Amplification Resist by Chemicals Kono A, Yada K, Horibe H, Ota H, Yanagi M KAGAKU KOGAKU RONBUNSHU, 36(6), 589, 2010 |