검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, Stern LA, Vladar AE, Postek MT, Mondol MK, Yang JKW, Berggren KK Journal of Vacuum Science & Technology B, 27(6), 2702, 2009 |
| 2 |
Resolution and total blur: Correlation and focus dependencies in e-beam lithography Keil K, Hauptmann M, Kretz J, Constancias C, Pain L, Bartha JW Journal of Vacuum Science & Technology B, 27(6), 2722, 2009 |
| 3 |
Development of pseudorandom binary arrays for calibration of surface profile metrology tools Barber SK, Soldate P, Anderson EH, Cambie R, McKinney WR, Takacs PZ, Voronov DL, Yashchuk VV Journal of Vacuum Science & Technology B, 27(6), 3213, 2009 |
| 4 |
The effect of thin metal overlayers on the electron beam exposure of polymethyl methacrylate Samantaray CB, Hastings JT Journal of Vacuum Science & Technology B, 26(6), 2300, 2008 |