검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography Yoo JB, Park SW, Kang HN, Mondkar HS, Sohn K, Kim HM, Kim KB, Lee H Polymer, 55(16), 3599, 2014 |
| 2 |
Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers Wang MX, Gonsalves KE, Yueh W, Roberts JM Macromolecular Rapid Communications, 27(18), 1590, 2006 |
| 3 |
Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties Liu JH, Shih JC Journal of Applied Polymer Science, 83(4), 889, 2002 |
| 4 |
Crosslinkable positive-tone photoresist comprising polymers with pendant carboxyl groups Liu JH, Shi CH, Chen WT Journal of Applied Polymer Science, 81(4), 1014, 2001 |