| 1 |
Photoelectrochemical etching of gallium nitride surface by complexation dissolution mechanism
Zhang MR, Hou F, Wang ZG, Zhang SH, Pan GB
Applied Surface Science, 410, 332, 2017 |
| 2 |
Photoelectrochemical etching of epitaxial InGaN thin films: self-limited kinetics and nanostructuring
Xiao XY, Fischer AJ, Coltrin ME, Lu P, Koleske DD, Wang GT, Polsky R, Tsao JY
Electrochimica Acta, 162, 163, 2015 |
| 3 |
A periodic array of silicon pillars fabricated by photoelectrochemical etching
Li X, Seo HS, Um HD, Jee SW, Cho Y, Yoo B, Lee JH
Electrochimica Acta, 54(27), 6978, 2009 |
| 4 |
Wall thickness and charge transport properties of nano-honeycomb TiO2 structures prepared by photoetching
Oekermann T, Yoshida T, Nakazawa J, Yasuno S, Sugiura T, Minoura H
Electrochimica Acta, 52(13), 4325, 2007 |
| 5 |
The growth of porous layer on resistive p-type Silicon in HF/Ethylene glycol under illumination
Chiboub N, Bellal F, Gabouze N, Sam S
Materials Science Forum, 480, 217, 2005 |
| 6 |
Photoelectrochemical etching of silicon derivatized with an electroactive thiophene-terminated alkyl monolayer: toward a redox center-induced etching activation and anisotropy
Fabre B, Wayner DDM
Journal of Electroanalytical Chemistry, 567(2), 289, 2004 |
| 7 |
Triangular pore formation in highly doped n-type 4H SIC
Shishkin Y, Choyke WJ, Devaty RP
Materials Science Forum, 457-460, 1467, 2004 |
| 8 |
Crystal-face and illumination intensity dependences of the quantum efficiency of photoelectrochemical etching, in relation to those of water photooxidation, at n-TiO2 (rutile) semiconductor electrodes
Kisumi T, Tsujiko A, Murakoshi K, Nakato Y
Journal of Electroanalytical Chemistry, 545, 99, 2003 |
| 9 |
DC and large-signal RF performance of recessed gate GaN MESFETs fabricated by the photoelectrochemical etching process
Lee WS, Chung KW, Shin MW
Materials Science Forum, 338-3, 1639, 2000 |
