| 1 |
Low-Voltage Poly-Si TFTs with Solution-Processed Aluminum Oxide Gate Dielectric
Kang I, Avis C, Kang DH, Jang J
Electrochemical and Solid State Letters, 14(8), J51, 2011 |
| 2 |
Surface Modification on Wet-Etched Patterned Sapphire Substrates Using Plasma Treatments for Improved GaN Crystal Quality and LED Performance
Shen KC, Wuu DS, Shen CC, Ou SL, Horng RH
Journal of the Electrochemical Society, 158(10), H988, 2011 |
| 3 |
Study on Thermal Stability of Plasma-PH3 Passivated HfAlO/In0.53Ga0.47As Gate Stack for Advanced Metal-Oxide-Semiconductor Field Effect Transistor
Suleiman SA, Oh HJ, Du A, Ng CM, Lee SJ
Electrochemical and Solid State Letters, 13(10), H336, 2010 |
| 4 |
Plasma Induced Low Temperature Crystallization of Lithium Transition-Metal Oxide Thin Films for Lithium Microbatteries
Chiu KF, Chen CC, Chiang MH, Ho WH
Journal of the Electrochemical Society, 157(2), A130, 2010 |
| 5 |
Teflon-Coated Carbon Fiber Core/Shell Structure Based Hydrophobic Gas-Diffusion Electrode for Proton Exchange Membrane Fuel Cells
Lee CM, Pai YH, Lin GR, Shieu FS
Journal of the Electrochemical Society, 157(2), B256, 2010 |
| 6 |
PFC-Free Dry Etching Method for Si Using Narrow-Gap VHF Plasma at Subatmospheric Pressure
Ohmi H, Kishimoto K, Kakiuchi H, Yasutake K
Journal of the Electrochemical Society, 157(2), D85, 2010 |
| 7 |
Structural Evolution and Electrochemical Performances of Oxygen Plasma-Treated LiMn2O4 Thin-Film Cathodes
Chen CC, Chiu KF, Lin KM, Lin HC, Yang CR, Wang FM, Chiang MH
Journal of the Electrochemical Society, 157(3), A289, 2010 |
| 8 |
Ultrahigh Selective Etching of SiO2 Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C4F8/CH2F2/O-2/Ar Plasmas
Kwon BS, Kim JS, Lee NE, Shon JW
Journal of the Electrochemical Society, 157(3), D135, 2010 |
| 9 |
Effects of Fluorine Incorporation on the Electrical Properties of Atomic-Layer-Deposited Al2O3 Gate Dielectric on InP Substrate
Chen YT, Zhao H, Yum JH, Wang YZ, Xue F, Zhou F, Lee JC
Journal of the Electrochemical Society, 157(3), G71, 2010 |
| 10 |
Plasma Damage on the OTS Treated SiO2 Substrate in the Source/Drain Electrode Deposition Process
Yun DJ, Rhee SW
Journal of the Electrochemical Society, 157(3), H349, 2010 |
