화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Lee HC, Bang JY, Chung CW
Thin Solid Films, 519(20), 7009, 2011
2 Two-dimensional calculation of spatial distribution of neutral atoms for a planar inductively coupled oxygen discharge
Yoon HJ, Chung TH, Chung CJ, Lee JK
Thin Solid Films, 506, 454, 2006
3 Spatially resolved fluorine actinometry
Shannon S, Holloway JP, Brake ML
Journal of Vacuum Science & Technology A, 17(5), 2703, 1999
4 End-Point and Etch Rate Control Using Dual-Wavelength Laser Reflectometry with a Nonlinear Estimator
Vincent TL, Khargonekar PP, Terry FL
Journal of the Electrochemical Society, 144(7), 2467, 1997
5 Etching Profiles and Neutral Shadowing in Long Trenches
Abrahamshrauner B, Wang CD
Journal of the Electrochemical Society, 143(2), 672, 1996