검색결과 : 5건
No. | Article |
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1 |
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma Lee HC, Bang JY, Chung CW Thin Solid Films, 519(20), 7009, 2011 |
2 |
Two-dimensional calculation of spatial distribution of neutral atoms for a planar inductively coupled oxygen discharge Yoon HJ, Chung TH, Chung CJ, Lee JK Thin Solid Films, 506, 454, 2006 |
3 |
Spatially resolved fluorine actinometry Shannon S, Holloway JP, Brake ML Journal of Vacuum Science & Technology A, 17(5), 2703, 1999 |
4 |
End-Point and Etch Rate Control Using Dual-Wavelength Laser Reflectometry with a Nonlinear Estimator Vincent TL, Khargonekar PP, Terry FL Journal of the Electrochemical Society, 144(7), 2467, 1997 |
5 |
Etching Profiles and Neutral Shadowing in Long Trenches Abrahamshrauner B, Wang CD Journal of the Electrochemical Society, 143(2), 672, 1996 |