| 1 |
Faceting of twin tips in polysilicon films
Nakhodkin NG, Kulish NP, Rodionova TV
Journal of Crystal Growth, 381, 65, 2013 |
| 2 |
Phase modifications in polysilicon films with fibrous and dendritic structure
Nakhodkin NG, Kulish NP, Rodionova TV, Strutinsky AM
Journal of Crystal Growth, 208(1-4), 297, 2000 |
| 3 |
Etching of silicon nitride in CCl2F2, CHF3, SiF4, and SF6 reactive plasma: A comparative study
Pant BD, Tandon US
Plasma Chemistry and Plasma Processing, 19(4), 545, 1999 |
| 4 |
Micro/nanomechanical characterization of ceramic films for microdevices
Li XD, Bhushan B
Thin Solid Films, 340(1-2), 210, 1999 |
| 5 |
Study on cat-CVD poly-Si films for solar cell application
Iiduka R, Heya A, Matsumura H
Solar Energy Materials and Solar Cells, 48(1), 279, 1997 |
| 6 |
Silicon Nucleation and Film Evolution on Silicon Dioxide Using Disilane - Rapid Thermal Chemical-Vapor-Deposition of Very Smooth Silicon at High Deposition Rates
Violette KE, Ozturk MC, Christensen KN, Maher DM
Journal of the Electrochemical Society, 143(2), 649, 1996 |
| 7 |
EFFECT OF FLUORINE CHEMISTRY IN THE REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON FILMS FROM Si2H6-SiF4-H2
Kim DH, Lee IJ, Rhee SW, Moon SH
Korean Journal of Chemical Engineering, 12(5), 572, 1995 |
| 8 |
Hydrofluoric-Acid Etching of Silicon Dioxide Sacrificial Layers .1. Experimental-Observations
Monk DJ, Soane DS, Howe RT
Journal of the Electrochemical Society, 141(1), 264, 1994 |
| 9 |
Comparative-Study of Large Grains and High-Performance TFTs in Low-Temperature Crystallized LPCVD and APCVD Amorphous-Silicon Films
Panwar OS, Moore RA, Raza SH, Gamble HS, Armstrong BM
Thin Solid Films, 237(1-2), 255, 1994 |
