검색결과 : 12건
No. | Article |
---|---|
1 |
Step-width adjustment in fabrication of staircase structures Li P, Lee SY, Jeon SC, Kim JS, Kim KN, Hyun MS, Yoo JJ, Kim JW Journal of Vacuum Science & Technology B, 28(1), 30, 2010 |
2 |
Sub-10-nm nanolithography with a scanning helium beam Sidorkin V, van Veldhoven E, van der Drift E, Alkemade P, Salemink H, Maas D Journal of Vacuum Science & Technology B, 27(4), L18, 2009 |
3 |
Self-powered near field electron lithography Lu YR, Yoshimizu N, Lal A Journal of Vacuum Science & Technology B, 27(6), 2537, 2009 |
4 |
Nanoscale geometry assisted proximity effect correction for electron beam direct write nanolithography Ocola LE Journal of Vacuum Science & Technology B, 27(6), 2569, 2009 |
5 |
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, Stern LA, Vladar AE, Postek MT, Mondol MK, Yang JKW, Berggren KK Journal of Vacuum Science & Technology B, 27(6), 2702, 2009 |
6 |
Resolution and total blur: Correlation and focus dependencies in e-beam lithography Keil K, Hauptmann M, Kretz J, Constancias C, Pain L, Bartha JW Journal of Vacuum Science & Technology B, 27(6), 2722, 2009 |
7 |
High density submicron features using a laser pattern generator and double patterning Gaevski ME, Watson GP, Novembre AE Journal of Vacuum Science & Technology B, 27(6), 2742, 2009 |
8 |
Model based optical proximity correction runtime saving with multisegment solver Li JL, Li XH, Deeth S, Lugg R, Melvin LS Journal of Vacuum Science & Technology B, 27(6), 2972, 2009 |
9 |
Automatic measurement of electron beam size by beam metrology technique using 20 nm test pattern Peroz C, Babin S, Machin M, Anderson E, Cabrini S, Dhuey S, Harteneck B Journal of Vacuum Science & Technology B, 27(6), 3220, 2009 |
10 |
Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45 nm node and beyond Ogino K, Hoshino H, Machida Y Journal of Vacuum Science & Technology B, 26(6), 2032, 2008 |