화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Step-width adjustment in fabrication of staircase structures
Li P, Lee SY, Jeon SC, Kim JS, Kim KN, Hyun MS, Yoo JJ, Kim JW
Journal of Vacuum Science & Technology B, 28(1), 30, 2010
2 Sub-10-nm nanolithography with a scanning helium beam
Sidorkin V, van Veldhoven E, van der Drift E, Alkemade P, Salemink H, Maas D
Journal of Vacuum Science & Technology B, 27(4), L18, 2009
3 Self-powered near field electron lithography
Lu YR, Yoshimizu N, Lal A
Journal of Vacuum Science & Technology B, 27(6), 2537, 2009
4 Nanoscale geometry assisted proximity effect correction for electron beam direct write nanolithography
Ocola LE
Journal of Vacuum Science & Technology B, 27(6), 2569, 2009
5 Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist
Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, Stern LA, Vladar AE, Postek MT, Mondol MK, Yang JKW, Berggren KK
Journal of Vacuum Science & Technology B, 27(6), 2702, 2009
6 Resolution and total blur: Correlation and focus dependencies in e-beam lithography
Keil K, Hauptmann M, Kretz J, Constancias C, Pain L, Bartha JW
Journal of Vacuum Science & Technology B, 27(6), 2722, 2009
7 High density submicron features using a laser pattern generator and double patterning
Gaevski ME, Watson GP, Novembre AE
Journal of Vacuum Science & Technology B, 27(6), 2742, 2009
8 Model based optical proximity correction runtime saving with multisegment solver
Li JL, Li XH, Deeth S, Lugg R, Melvin LS
Journal of Vacuum Science & Technology B, 27(6), 2972, 2009
9 Automatic measurement of electron beam size by beam metrology technique using 20 nm test pattern
Peroz C, Babin S, Machin M, Anderson E, Cabrini S, Dhuey S, Harteneck B
Journal of Vacuum Science & Technology B, 27(6), 3220, 2009
10 Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45 nm node and beyond
Ogino K, Hoshino H, Machida Y
Journal of Vacuum Science & Technology B, 26(6), 2032, 2008