| 1 |
Comparison of microstructural and optoelectronic properties of NiO:Cu thin films deposited by ion-beam assisted rf sputtering in different gas atmospheres
Wen CK, Xin YQ, Chen SC, Chuang TH, Chen PJ, Sun H
Thin Solid Films, 677, 103, 2019 |
| 2 |
Non-polar GaN thin films deposition on glass substrate at low temperatures by conventional RF sputtering
Simanullang M, Wang ZH, Kawakami N, Ogata R, Yoshida T, Sugiyama M
Thin Solid Films, 675, 1, 2019 |
| 3 |
Influence of oxygen flow rate and substrate positions on properties of Cu-oxide thin films fabricated by radio frequency magnetron sputtering using pure Cu target
Patwary MAM, Saito K, Guo QX, Tanaka T
Thin Solid Films, 675, 59, 2019 |
| 4 |
Influence of thickness and microstructure on thermoelectric properties of Mg-doped CuCrO2 delafossite thin films deposited by RF-magnetron sputtering
Sinnarasa I, Thimont Y, Presmanes L, Bonningue C, Barnabe A, Tailhades P
Applied Surface Science, 455, 244, 2018 |
| 5 |
Radio frequency power induced changes of structural, morphological, optical and electrical properties of sputtered cadmium oxide thin films
Sakthivel P, Murugan R, Asaithambi S, Karuppaiah M, Vijayaprasath G, Rajendran S, Hayakawa Y, Ravi G
Thin Solid Films, 654, 85, 2018 |
| 6 |
Transparent conductive Hf-doped In2O3 thin films by RF sputtering technique at low temperature annealing
Wang GH, Shi CY, Zhao L, Diao HW, Wang WJ
Applied Surface Science, 399, 716, 2017 |
| 7 |
Enhanced thermoelectric properties of Ge2Sb2Te5 thin films through the control of crystal structure
Kang SH, Jella V, Pammi SVN, Eom JH, Choi JS, Jeong JR, Yoon SG
Current Applied Physics, 17(5), 744, 2017 |
| 8 |
Optical and electrical properties of gallium doped indium tin oxide optimized for low deposition temperature applications
Campa A, Berginc M, Vojisavljevic K, Malic B, Panjan P, Topic M
Thin Solid Films, 621, 52, 2017 |
| 9 |
Electrochromic characteristics of radio frequency plasma sputtered WO3 thin films onto flexible polyethylene terephthalate substrates
Eren E, Karaca GY, Koc U, Oksuz L, Oksuz AU
Thin Solid Films, 634, 40, 2017 |
| 10 |
Effects of RF magnetron sputtering deposition process parameters on the properties of molybdenum thin films
Chelvanathan P, Shahahmadi SA, Arith F, Sobayel K, Aktharuzzaman M, Sopian K, Alharbi FH, Tabet N, Amin N
Thin Solid Films, 638, 213, 2017 |
