| 1 |
Influence of ternary elements (X = Si, B, Cr) on TiAlN coating deposited by magnetron sputtering process with single alloying targets
Jung DH, Moon KI, Shin SY, Lee CS
Thin Solid Films, 546, 242, 2013 |
| 2 |
Reactive sputtering of precursors for Cu2ZnSnS4 thin film solar cells
Ericson T, Kubart T, Scragg JJ, Platzer-Bjorkman C
Thin Solid Films, 520(24), 7093, 2012 |
| 3 |
A virtual metrology model based on recursive canonical variate analysis with applications to sputtering process
Pan TH, Sheng BQ, Wong DSH, Jang SS
Journal of Process Control, 21(6), 830, 2011 |
| 4 |
Hysteresis behaviour of reactive high power impulse magnetron sputtering
Audronis M, Bellido-Gonzalez V
Thin Solid Films, 518(8), 1962, 2010 |
| 5 |
Tribological properties of Cr-Si-N nanocomposite film adherent silicon under various environments
Lin HH, Chou CC, Lee JW
Thin Solid Films, 518(24), 7509, 2010 |
| 6 |
An ion momentum as a novel parameter for the preparation of the magnetostrictive thin film
Makita K, Takeuchi M, Sato M, Uchida H, Matsumura Y
Applied Surface Science, 256(4), 1265, 2009 |
| 7 |
Synthesis and characterization of titanium and zirconium oxynitride-coatings
Rizzo A, Signore MA, Mirenghi L, Di Luccio T
Thin Solid Films, 517(21), 5956, 2009 |
| 8 |
Molecular dynamics study of particle emission by reactive cluster ion impact
Aoki T, Matsuo J
Applied Surface Science, 252(19), 6466, 2006 |
| 9 |
The oriented growth of zirconia thin films on NaCl (001) surface
Yeh SW, Huang HL, Gan DS, Shen PY
Journal of Crystal Growth, 289(2), 690, 2006 |
| 10 |
Dynamic behaviour of the reactive sputtering process
Kubart T, Kappertz O, Nyberg T, Berg S
Thin Solid Films, 515(2), 421, 2006 |
