| 1 |
Pulsed laser deposited KY3F10: Ho3+ thin films: Influence of target to substrate distance
Debelo NG, Dejene FB, Roro KT
Materials Chemistry and Physics, 190, 62, 2017 |
| 2 |
The influences of high energetic oxygen negative ions and active oxygen on the microstructure and electrical properties of ZnO:Al films by MF magnetron sputtering
Hao CS, Xie B, Li M, Wang HQ, Jiang YS, Song YZ
Applied Surface Science, 258(20), 8234, 2012 |
| 3 |
Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering
Jeong SH, Boo JH
Thin Solid Films, 447, 105, 2004 |
| 4 |
Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition
Agura H, Suzuki A, Matsushita T, Aoki T, Okuda M
Thin Solid Films, 445(2), 263, 2003 |
| 5 |
Influence of deposition parameters on the structural, optical and electrical properties of amorphous carbon and amorphous carbon nitride films grown by pulsed laser deposition using camphoric carbon target
Rusop M, Tian XM, Soga T, Jimbo T, Umeno M
Molecular Crystals and Liquid Crystals, 388, 509, 2002 |
| 6 |
Highly conducting transparent indium tin oxide films prepared by pulsed laser deposition
Suzuki A, Matsushita T, Aoki T, Mori A, Okuda M
Thin Solid Films, 411(1), 23, 2002 |
