| 1 |
Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios
Choi S, Kang J, Park J, Kang YC
Thin Solid Films, 571, 84, 2014 |
| 2 |
Reaction mechanism of tin nitride (de)lithiation reaction studied by means of Sn-119 Mossbauer spectroscopy
Baggetto L, Jumas JC, Hintzen HT, Notten PHL
Electrochimica Acta, 55(22), 6617, 2010 |
| 3 |
Electrochromic properties of InN:Sn films deposited by reactive evaporation
Inoue Y, Takeuchi H, Ishikawa H, Takai O
Thin Solid Films, 518(3), 1001, 2009 |
| 4 |
Structure of reactively sputter deposited tin-nitride thin films: A combined X-ray photoelectron spectroscopy, in situ X-ray reflectivity and X-ray absorption spectroscopy study
Lutzenkirchen-Hecht D, Frahm R
Thin Solid Films, 493(1-2), 67, 2005 |
| 5 |
Elastic and plastic work of indentation as a characteristic of wear behavior for cutting tools with nitride PVD coatings
Fox-Rabinovich GS, Veldhuis SC, Scvortsov VN, Shuster LS, Dosbaeva GK, Migranov MS
Thin Solid Films, 469-470, 505, 2004 |
| 6 |
Photoelectrochemical characterisation of indium nitride and tin nitride in aqueous solution
Lindgren T, Larsson M, Lindquist SE
Solar Energy Materials and Solar Cells, 73(4), 377, 2002 |
| 7 |
Characteristics of tin nitride thin-film negative electrode for thin-film microbattery
Park KS, Park YJ, Kim MK, Son JT, Kim HG, Kim SJ
Journal of Power Sources, 103(1), 67, 2001 |
| 8 |
The permanent electric dipole moments of chromium and vanadium mononitride: CrN and VN
Steimle TC, Robinson JS, Goodridge D
Journal of Chemical Physics, 110(2), 881, 1999 |
| 9 |
Properties of various sputter-deposited Cu-N thin films
Wang DY, Nakamine N, Hayashi Y
Journal of Vacuum Science & Technology A, 16(4), 2084, 1998 |
