검색결과 : 1건
No. | Article |
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Silicide Formation of Atomic Layer Deposition Co Using Ti and Ru Capping Layer Yoon J, Lee HBR, Gu GH, Park CG, Kim H Korean Journal of Materials Research, 22(4), 202, 2012 |
No. | Article |
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1 |
Silicide Formation of Atomic Layer Deposition Co Using Ti and Ru Capping Layer Yoon J, Lee HBR, Gu GH, Park CG, Kim H Korean Journal of Materials Research, 22(4), 202, 2012 |