화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers
van Assche FJH, Unnikrishnan S, Michels JJ, van Mol AMB, van de Weijer P, van de Sanden MCM, Creatore M
Thin Solid Films, 558, 54, 2014
2 High rate (similar to 3 nm/s) deposition of dense silicon nitride films at low substrate temperatures (< 150 degrees C) using the expanding thermal plasma and substrate biasing
van Assche FJH, Kessels WMM, Vangheluwe R, Mischke WS, Evers M, Ab FJHVA
Thin Solid Films, 484(1-2), 46, 2005
3 Plasma diagnostic study of silicon nitride film growth in a remote Ar-H-2-N2-SiH4 plasma: Role of N and SiHn radicals
Kessels WMM, van Assche FJH, Hong J, Schram DC, van de Sanden MCM
Journal of Vacuum Science & Technology A, 22(1), 96, 2004
4 High-rate deposition of a-SiNx : H for photovoltaic applications by the expanding thermal plasma
Kessels WMM, Hong J, van Assche FJH, Moschner JD, Lauinger T, Soppe WJ, Weeber AW, Schram DC, van de Sanden MCM
Journal of Vacuum Science & Technology A, 20(5), 1704, 2002